The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 13, 2025

Filed:

Dec. 02, 2020
Applicant:

Korea Electronics Technology Institute, Seongnam-si, KR;

Inventors:

Sung Hee Hong, Seoul, KR;

Young Min Kim, Seoul, KR;

Ji Soo Hong, Seoul, KR;

Jin Soo Jeong, Seoul, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03H 1/04 (2006.01); G03H 1/02 (2006.01); G03H 1/12 (2006.01);
U.S. Cl.
CPC ...
G03H 1/0476 (2013.01); G03H 1/02 (2013.01); G03H 1/12 (2013.01); G03H 2001/0224 (2013.01); G03H 2001/0292 (2013.01); G03H 2223/53 (2013.01);
Abstract

A method and an apparatus for printing a hologram by using a mask are provided. A method generates a hologram fringe pattern, splits the hologram fringe pattern on a hogel basis, generates the split hogels, masks a part of the generated hogel, and prints the masked hogel on a hologram medium. Accordingly, an empty space which occurs between hogels when a hologram is printed is prevented from being generated by using a mask, so that a fill factor can be effectively enhanced, and eventually, image quality of a hologram can be enhanced.


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