The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2025
Filed:
Jul. 29, 2020
Athena Technologies, Rotterdam, NL;
Marco Stefancich, Delft, NL;
Athena Technologies, Rotterdam, NL;
Abstract
A method for manufacturing a three-dimensional structure by localized electroforming of a material from an electrolytic solution includes emitting a jet of the electrolytic solution towards a target substrate, controlling position of the jet with respect to the target substrate, and controlling potential difference between a control electrode and the target substrate or an ion current intensity through the jet between the control electrode and the target substrate to obtain deposition of material on the target substrate or removal of material from the target substrate. The method further includes injecting a predetermined probing electrical current into an electroforming circuit including the control electrode, the jet, and the target substrate, detecting potential difference across the electroforming circuit, determining present elevation of the three-dimensional structure, comparing the present elevation with a predetermined design elevation and calculating a corresponding elevation difference, and modulating physical parameters of localized electroforming affecting deposition or removal rate.