The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 13, 2025

Filed:

Dec. 27, 2022
Applicant:

Semes Co., Ltd., Chungcheongnam-do, KR;

Inventors:

Jun Kil Hwang, Gyeonggi-do, KR;

Min Jung Kim, Chungcheongnam-do, KR;

Hee Hwan Kim, Sejong-si, KR;

Seong Soo Lee, Gyeonggi-do, KR;

Assignee:

SEMES CO., LTD., Chungcheongnam-Do, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23F 1/46 (2006.01); B08B 3/02 (2006.01); B08B 3/04 (2006.01); B08B 3/08 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C23F 1/46 (2013.01); B08B 3/022 (2013.01); B08B 3/041 (2013.01); B08B 3/08 (2013.01); B08B 2203/007 (2013.01); H01L 21/02057 (2013.01);
Abstract

Disclosed is a method of adjusting a concentration of a chemical liquid in a treatment liquid, the method including: treating a substrate by supplying a treatment liquid stored in a main tank from a nozzle in a heated state to the substrate, and recovering the treatment liquid used in the treatment of the substrate to the main tank directly or via still another tank, and then reusing the recovered treatment liquid, a concentration adjustment operation of adjusting a concentration of the treatment liquid in the main tank is performed in a standby time period in which the substrate is not treated with the treatment liquid, and the concentration adjustment operation is performed by discharging the treatment liquid in a heated state from the nozzle to evaporate a part of the diluting solution, and recovering the discharged treatment liquid to the main tank.


Find Patent Forward Citations

Hwang, Jun. (2025). Apparatus and method of treating substrate (U.S. Patent No. 12297545). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12297545

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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