The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 13, 2025

Filed:

Feb. 15, 2021
Applicant:

Robert Bosch Gmbh, Stuttgart, DE;

Inventor:

Christoph Schelling, Stuttgart, DE;

Assignee:

Robert Bosch GmbH, Stuttgart, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/56 (2006.01); C23C 16/40 (2006.01); C23C 16/50 (2006.01); G01N 27/414 (2006.01);
U.S. Cl.
CPC ...
C23C 16/56 (2013.01); C23C 16/40 (2013.01); C23C 16/50 (2013.01); G01N 27/4141 (2013.01); G01N 27/4145 (2013.01); G01N 27/4146 (2013.01);
Abstract

A method for producing a nanoscale channel structure disclosed. The method includes depositing and structuring a first sacrificial layer on a substrate, depositing a second sacrificial layer on the substrate and on the first sacrificial layer, depositing an etching masking layer on the second sacrificial layer, partly removing the etching masking layer and the second sacrificial layer, removing the first sacrificial layer and additionally partly removing the second sacrificial layer, depositing a wall layer on the etching masking layer and on the substrate, structuring access openings to the second sacrificial layer, and removing the remaining second sacrificial layer.


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