The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2025
Filed:
Jul. 12, 2023
Xerox Corporation, Norwalk, CT (US);
Yunda Wang, Milpitas, CA (US);
Sourobh Raychaudhuri, Mountain View, CA (US);
JengPing Lu, Fremont, CA (US);
Eugene M. Chow, Palo Alto, CA (US);
Julie A. Bert, East Palo Alto, CA (US);
David Biegelsen, Portola Valley, CA (US);
George A. Gibson, Fairport, NY (US);
Jamie Kalb, Mountain View, CA (US);
Xerox Corporation, Norwalk, CT (US);
Abstract
Disclosed herein are techniques for transferring particles in a pattern. In one implementation, a particle-transferring system includes a first substrate comprising a first surface configured to support a plurality of particles in a non-uniform pattern, and a particle transfer unit configured to remove the plurality of particles from the first surface in response to the plurality of particles being within a first gap. The system also includes a second substrate configured to remove the plurality of particles from the particle transfer unit and secure the plurality of particles to the second surface in response to the plurality of particles being within a second gap. The particle transfer unit is configured to transfer the plurality of particles and maintain the non-uniform pattern regardless of the positions of the plurality of particles, which are not predefined to fit features of the particle transfer unit.