The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2025
Filed:
Jan. 12, 2022
Applicants:
Samsung Electronics Co., Ltd., Suwon-si, KR;
Dongwoo Fine-chem Co., Ltd., Iksan-si, KR;
Inventors:
Min Hyung Cho, Suwon-si, KR;
Hyo Joong Yoon, Iksan-si, KR;
Min Ju Im, Iksan-si, KR;
Jung Min Oh, Incheon, KR;
Sang Won Bae, Suwon-si, KR;
Hyo San Lee, Hwaseong-si, KR;
Assignees:
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;
DONGWOO FINE-CHEM CO., LTD., Iksan-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 13/00 (2006.01); H01L 21/3213 (2006.01); H01L 21/768 (2006.01);
U.S. Cl.
CPC ...
C09K 13/00 (2013.01); H01L 21/32134 (2013.01); H01L 21/76805 (2013.01); H01L 21/76843 (2013.01); H01L 21/76895 (2013.01);
Abstract
Etching compositions are provided. The etching compositions can be used for etching cobalt. The etching compositions may include a chelator, water, an oxidizer, and an organic solvent, and the chelator may include an organic acid, an amine compound and/or a polyhydric alcohol. Water may be present in an amount of 1 wt % to 10 wt % based on a total weight of the etching composition.