The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2025
Filed:
Jul. 14, 2021
Schott Ag, Mainz, DE;
Andreas Ortner, Gau-Algesheim, DE;
Andreas Roters, Mainz, DE;
Frank-Thomas Lentes, Bingen, DE;
Lutz Parthier, Kleinmachnow, DE;
Markus Heiss-Chouquet, Bischofsheim, DE;
Ulrich Peuchert, Bodenheim, DE;
Fabian Wagner, Mainz, DE;
Florian Resch, Mainz, DE;
Laura Brückbauer, Dorn-Dürkheim, DE;
Matthias Jotz, Mainz, DE;
Vanessa Glaßer, Mainz, DE;
Schott AG, Mainz, DE;
Abstract
A method includes: providing a plate-like glass element having side faces and an ultrashort pulse laser having a laser beam; directing the laser beam onto one of the side faces; concentrating the laser beam by focusing optics to form an elongated focus in the glass element; producing a filament-shaped flaw in a volume of the glass element by a radiated-in energy of the laser beam, a longitudinal direction of which runs transverse to one of the side faces, and the ultrashort pulse laser radiates in a pulse or a pulse packet having at least two successive laser pulses to produce the filament-shaped flaw; widening the filament-shaped flaw to form a channel by exposing the glass element to an etching including an etching medium which removes glass at a rate of less than 8 μm per hour; and introducing rounded, hemispherical depressions in a wall of the channel by the etching.