The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2025
Filed:
Dec. 14, 2023
Infineon Technologies Ag, Neubiberg, DE;
Wolfgang Klein, Zorneding, DE;
Evangelos Angelopoulos, Munich, DE;
Stefan Barzen, Munich, DE;
Marc Fueldner, Neubiberg, DE;
Stefan Geißler, Regensburg, DE;
Matthias Friedrich Herrmann, Munich, DE;
Ulrich Krumbein, Rosenheim, DE;
Konstantin Tkachuk, Unterhaching, DE;
Giordano Tosolini, Munich, DE;
Juergen Wagner, Nittendorf, DE;
Infineon Technologies AG, Neubiberg, DE;
Abstract
In an embodiment, a method for forming a microfabricated structure includes depositing a first membrane on a substrate, depositing a first isolation layer on the first membrane, depositing a stator layer on the first isolation layer, forming a perforated stator from the stator layer, wherein the first isolation layer is disposed on a first surface of the perforated stator, depositing a second isolation layer on a second surface of the perforated stator and depositing a second membrane on the second isolation layer, including depositing a pillar coupled between the first membrane and the second membrane, wherein the first isolation layer includes a first glass layer having a low etch rate, and a second glass layer having a high etch rate embedded in the first glass layer.