The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 13, 2025

Filed:

Jan. 19, 2023
Applicant:

The University of Hong Kong, Hong Kong, CN;

Inventors:

Liqiu Wang, Hong Kong, CN;

Wei Li, Hong Kong, CN;

Jiaqian Li, Hong Kong, CN;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 69/02 (2006.01); B33Y 80/00 (2015.01); C08L 83/04 (2006.01); B29K 83/00 (2006.01); B29L 31/00 (2006.01); B33Y 10/00 (2015.01);
U.S. Cl.
CPC ...
B29C 69/02 (2013.01); B33Y 80/00 (2014.12); C08L 83/04 (2013.01); B29K 2083/00 (2013.01); B29L 2031/772 (2013.01); B33Y 10/00 (2014.12);
Abstract

A durable superomniphobic device is presented where the polymeric device has a surface that includes doubly re-entrant micropillars residing within pockets that are partitioned within a matrix of interconnected doubly re-entrant walls. The doubly re-entrant matrix can be in a pattern where walls that are equal to or greater in height to the micropillars intersect or otherwise contact to provide protection to the more fragile micropillars. These durable superomniphobic devices can be formed by injection molding and can repel liquids having a surface tension of about 18 to about 98 mN mand display liquid contact angle of greater than or equal to 150°.


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