The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 13, 2025

Filed:

Mar. 02, 2020
Applicant:

Corning Incorporated, Corning, NY (US);

Inventors:

Anping Liu, Horseheads, NY (US);

Matthew Ryan Ross, Big Flats, NY (US);

Craig John Mancusi Ungaro, Corning, NY (US);

Erin Kathleen Watkins, Corning, NY (US);

Assignee:

CORNING INCORPORATED, Corning, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 26/402 (2014.01); B23K 26/064 (2014.01); B23K 26/073 (2006.01); B23K 26/382 (2014.01); B23K 26/386 (2014.01); B23K 26/53 (2014.01); C03C 15/00 (2006.01); C03C 23/00 (2006.01); G02B 5/00 (2006.01); G02B 27/09 (2006.01); B23K 103/00 (2006.01);
U.S. Cl.
CPC ...
B23K 26/402 (2013.01); B23K 26/064 (2015.10); B23K 26/0734 (2013.01); B23K 26/382 (2015.10); B23K 26/386 (2013.01); B23K 26/53 (2015.10); C03C 15/00 (2013.01); C03C 23/0025 (2013.01); G02B 5/001 (2013.01); G02B 27/0916 (2013.01); G02B 27/0927 (2013.01); G02B 27/0938 (2013.01); B23K 2103/54 (2018.08);
Abstract

The systems and methods disclosed herein utilize a beam-forming system configured to convert a Gaussian laser beam into an annular vortex laser beam having a relatively large depth of focus, which enables the processing of thick or stacked glass-based objects annular laser beam is defined in part by a topological charge m that defines an amount of rotation of the annular vortex beam around its central axis as it propagates annular vortex beam is used to form micro-holes in a glass-based object using either a one-step or a two-step method micro-holes formed by either process can be in the form of recesses or through-holes, depending on the application size of the micro-holes can be controlled by controlling the size of the annular vortex beam over the depth of focus range.


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