The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 13, 2025

Filed:

May. 06, 2019
Applicant:

Beijing Yakebot Technology Co., Ltd, Beijing, CN;

Inventors:

Lifeng Wang, Beijing, CN;

Chen Shen, Beijing, CN;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61C 13/00 (2006.01); A61B 34/10 (2016.01); A61C 8/00 (2006.01);
U.S. Cl.
CPC ...
A61C 13/0004 (2013.01); A61B 34/10 (2016.02); A61C 8/00 (2013.01); A61B 2034/105 (2016.02); A61B 2034/108 (2016.02);
Abstract

Embodiments of the present application provides a method and a system for evaluating implanting precision of an implant. The method includes: obtaining a second surface model of an oral cavity containing a target implant; obtaining an actual position of the target implant in a first three-dimensional model based on the second surface model, the first three-dimensional model and a first surface model; and obtaining an evaluation result of the implanting precision of the target implant based on the actual position of the target implant in the first three-dimensional model and an predicted position of the target implant in the first three-dimensional model. By means of the method and system according to the embodiments of the present application, the second surface model of the oral cavity containing the target implant is obtained after implantation is completed using an oral digital scanning device to obtain the evaluation result of the implanting precision of an implant of the target implant. More accurate evaluation result of implant can be obtained due to the elimination of metallic implant artifacts in the obtained secondary surface model as compared to the three-dimensional digital model obtained based on CT device in the prior art.


Find Patent Forward Citations

Wang, Lifeng. (2025). Method and system for evaluating implanting precision of an implant (U.S. Patent No. 12295801). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12295801

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…