The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 06, 2025

Filed:

Jun. 27, 2023
Applicant:

China Institute of Atomic Energy, Beijing, CN;

Inventors:

Tianjue Zhang, Beijing, CN;

Wei Fu, Beijing, CN;

Chuan Wang, Beijing, CN;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H 13/00 (2005.12);
U.S. Cl.
CPC ...
H05H 13/005 (2012.12);
Abstract

The present application provides a method for obtaining strong focusing of an isochronous accelerator by varying the magnetic field gradient in a large radial range. The method is characterized by the main magnet of the isochronous accelerator providing not only a bending effect but also a focusing effect, equivalent to the effects of quadrupole, sextupole, and octupole magnets used in a synchrotron accelerator.


Find Patent Forward Citations

Zhang, Tianjue. (2025). Method for obtaining strong focusing of isochronous accelerator by varying magnetic field gradient in large radial range (U.S. Patent No. 12295091). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12295091

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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