The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 06, 2025
Filed:
Oct. 27, 2022
Samsung Electronics Co., Ltd., Suwon-si, KR;
Byeongwook Yoo, Suwon-si, KR;
Gunill Lee, Suwon-si, KR;
Wonwoo Lee, Suwon-si, KR;
Jiwon Jeong, Suwon-si, KR;
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;
Abstract
A device and method of obtaining a depth of a space are provided. The method includes obtaining a plurality of images by photographing a periphery of a camera a plurality of times while sequentially rotating the camera by a preset angle, identifying a first feature region in a first image and an n-th feature region in an n-th image, the n-th feature region being identical with the first feature region, by comparing adjacent images between the first image and the n-th image from among the plurality of images, obtaining a base line value with respect to the first image and the n-th image, obtaining a disparity value between the first feature region and the n-th feature region, and determining a depth of the first feature region or the n-th feature region based on at least the base line value and the disparity value.