The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 06, 2025
Filed:
Dec. 15, 2021
Applicant:
Adaptive Plasma Technology Corp., Icheon-si, KR;
Inventors:
Woo Hyung Choi, Seongnam-si, KR;
Sang Woo Lee, Suwon-si, KR;
Assignee:
VM INC., Icheon, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/683 (2005.12); H01L 21/67 (2005.12);
U.S. Cl.
CPC ...
H01L 21/6833 (2012.12); H01L 21/67103 (2012.12);
Abstract
Provided is an electrostatic chuck with multiple heater zones. The electrostatic chuck with multiple heater zones comprises multiple micro heater zones; a switch module having each switching means connected to each micro heater zone; and a switch controlling module for controlling an operation of the switch module, wherein each micro heater zone can be heated individually by a corresponding heating element, and each partial area of a wafer secured on the electrostatic chuck is heated independently by each micro heater zone.