The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 06, 2025
Filed:
Jul. 24, 2023
Applicant:
Asm Ip Holding B.v., Almere, NL;
Inventors:
YoungChol Byun, Tempe, AZ (US);
Bed Prasad Sharma, Gilbert, AZ (US);
Shankar Swaminathan, Phoenix, AZ (US);
Eric James Shero, Phoenix, AZ (US);
Assignee:
ASM IP Holding B.V., Almere, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2005.12); C23C 16/36 (2005.12); H01L 21/02 (2005.12); H01L 21/768 (2005.12);
U.S. Cl.
CPC ...
H01L 21/02126 (2012.12); C23C 16/36 (2012.12); C23C 16/45553 (2012.12); H01L 21/02274 (2012.12); H01L 21/0228 (2012.12); H01L 21/76829 (2012.12);
Abstract
A method for forming a layer comprising SiOCN on a substrate is disclosed. An exemplary method includes thermally depositing the layer comprising SiOCN on a surface of the substrate. The layer comprising SiOCN can be used for various applications, including spacers, etch stop layers, and etch resistant layers.