The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 06, 2025
Filed:
Sep. 09, 2019
Applicant:
Dexerials Corporation, Tokyo, JP;
Inventor:
Yuichi Kamori, Tokyo, JP;
Assignee:
Dexerials Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2005.12); C04B 35/495 (2005.12); C22C 1/047 (2022.12); C22C 30/00 (2005.12); G11B 7/243 (2012.12); H01J 37/34 (2005.12);
U.S. Cl.
CPC ...
H01J 37/3429 (2012.12); C04B 35/495 (2012.12); C22C 1/047 (2022.12); C22C 30/00 (2012.12); C23C 14/3414 (2012.12); H01J 37/3491 (2012.12); C22C 2200/00 (2012.12); G11B 2007/2432 (2012.12);
Abstract
Provided is a Mn—Ta—W—Cu—O-based sputtering target including, in the component composition, Mn, Ta, W, Cu, and O. The sputtering target has a relative density of at least 90%, and includes a crystal phase of MnTaO. Also provided is a production method for the sputtering target.