The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 06, 2025
Filed:
Dec. 27, 2021
Soochow University, Suzhou, CN;
Yahong Chen, Suzhou, CN;
Zhen Dong, Suzhou, CN;
Xi Sun, Suzhou, CN;
Fei Wang, Suzhou, CN;
Yangjian Cai, Suzhou, CN;
SOOCHOW UNIVERSITY, Suzhou, CN;
Abstract
The invention provides a method and a system for generating a polarized propagation-invariant light field. The system includes a laser source, a spatial light modulator, a computer, a first lens, a shading element, a first quarter-wave plate, a second quarter-wave plate, a second lens, and a beam combining element. In the present invention, two Laguerre-Gaussian mode beams that satisfy a particular Gouy order relationship are generated, and orthogonal even polarization is applied to the two Laguerre-Gaussian mode beams. The two Laguerre-Gaussian mode beams are then focused onto a Ronchi grating to be stably combined into polarized propagation-invariant light field. The light field generated in the present invention simultaneously has linear polarization, elliptical polarization, and circular polarization in a cross section of the light field, and in a propagation process of the light field in free space, apart from normal spot size scaling, polarization distribution remains unchanged.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile