The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 06, 2025
Filed:
Jan. 23, 2023
Applicant:
Shenzhen Angstrom Excellence Technology Co. Ltd, ShenZhen, CN;
Inventors:
Assignee:
SHENZHEN ANGSTROM EXCELLENCE TECHNOLOGY CO. LTD, Shenzhen, CN;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/201 (2017.12); G01N 23/207 (2017.12); G01N 23/2206 (2017.12); G01N 23/223 (2005.12);
U.S. Cl.
CPC ...
G01N 23/2206 (2012.12); G01N 23/201 (2012.12); G01N 23/207 (2012.12); G01N 23/223 (2012.12); G01N 2223/052 (2012.12); G01N 2223/054 (2012.12); G01N 2223/056 (2012.12); G01N 2223/071 (2012.12); G01N 2223/076 (2012.12); G01N 2223/1016 (2012.12); G01N 2223/3307 (2012.12); G01N 2223/6116 (2012.12);
Abstract
An X-ray analysis system is provided with multi-source design and an X-ray analysis method is provided with multi-source design. According to the embodiments, the X-ray analysis system includes a ray source including a plurality of ray generating devices that generate a ray; a detector that detects a signal generated due to an analyzed object being irradiated by the ray from the ray source; and a controller that controls the ray source, so that two or more ray generating devices in the ray source simultaneously generate corresponding rays to irradiate the analyzed object.