The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 06, 2025
Filed:
Mar. 06, 2020
Osaka University, Suita, JP;
Yushiro Chemical Industry Co., Ltd., Tokyo, JP;
Akira Harada, Suita, JP;
Hiroyasu Yamaguchi, Suita, JP;
Yoshinori Takashima, Suita, JP;
Motofumi Osaki, Suita, JP;
Yasumasa Ohashi, Koza-gun, JP;
Hiroaki Takahashi, Koza-gun, JP;
Hidenori Shirakawa, Koza-gun, JP;
OSAKA UNIVERSITY, Osaka, JP;
YUSHIRO CHEMICAL INDUSTRY CO., LTD., Tokyo, JP;
Abstract
Provided is a macromolecular material that has self-healing properties, excellent stretchability, and a high degree of freedom in the design of stretchability, strength, and hardness, and that can be produced by a simple method; and also provided is a method for producing the same. The macromolecular material of the present invention comprises a polymer having a host group and a guest group. The host group is a monovalent group formed by removing one hydrogen atom or hydroxy group from a cyclodextrin derivative. The polymer is a polymer of a monomer mixture containing a host group-containing polymerizable monomer, a guest group-containing polymerizable monomer, and a third polymerizable monomer, and the third polymerizable monomer contains a (meth)acrylic ester compound. The host group-containing polymerizable monomer and the guest group-containing polymerizable monomer have a property of being dissolved in the third polymerizable monomer.