The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 06, 2025

Filed:

Sep. 15, 2022
Applicant:

Semes Co., Ltd., Chungcheongnam-do, KR;

Inventors:

Sung Ho Kim, Chungcheongnam-do, KR;

Bo Yeon Hwang, Chungcheongnam-do, KR;

Chang Jin Moon, Seoul, KR;

Sol Min Park, Chungcheongnam-do, KR;

Sang Seok Kim, Chungcheongnam-do, KR;

Assignee:

SEMES CO., LTD., Chungcheongnam-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41J 2/04 (2005.12); B41J 2/045 (2005.12); B41M 3/00 (2005.12); B41M 5/00 (2005.12);
U.S. Cl.
CPC ...
B41J 2/04556 (2012.12); B41J 2/04581 (2012.12); B41M 3/006 (2012.12); B41M 5/0047 (2012.12); B41M 5/007 (2012.12);
Abstract

The present disclosure provides a method for processing a substrate that can maintain a production amount even when a production model is changed. The method for processing a substrate comprises: disposing the substrate on a levitation stage; measuring a distance between the substrate and an inkjet head module; and changing a discharging speed of ink to be discharged from the inkjet head module based on the measured distance.


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