The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 06, 2025
Filed:
Jun. 27, 2023
Applicant:
Semes Co., Ltd., Cheonan-si, KR;
Inventors:
Soo Young Park, Incheon, KR;
Ohyeol Kwon, Cheonan-si, KR;
Jun Keon Ahn, Sejong-si, KR;
Jung Hwan Lee, Pyeongtaek-si, KR;
Seong Soo Lee, Suwon-si, KR;
Assignee:
Semes Co., Ltd., Cheonan-si, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B23K 26/0622 (2013.12); B23K 26/08 (2013.12); B23K 26/10 (2005.12); B23K 26/40 (2013.12); B23K 103/00 (2005.12);
U.S. Cl.
CPC ...
B23K 26/0622 (2015.09); B23K 26/0823 (2012.12); B23K 26/40 (2012.12); B23K 26/103 (2012.12); B23K 2103/50 (2018.07);
Abstract
Disclosed is a method for removing a film from a substrate by irradiating a plurality of unit pulse laser beams to an edge region of the substrate. The method includes a first irradiation operation for irradiating a plurality of unit pulse laser beams onto the substrate while the substrate is rotating, and a second irradiation operation for irradiating a plurality of unit pulse laser beams to regions of the substrate onto which the unit pulse laser beams are not irradiated in the first irradiation operation.