The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 2025
Filed:
Jul. 06, 2023
Fujifilm Corporation, Tokyo, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
Pixels of a mask image with which a target object is irradiated are shifted by a determined distance by sequentially turning on one light emission point or two or more light emission points of a light source with respect to a single mask pattern generated in a spatial modulation element, a pixel shift amount of the mask pattern determined by a position of the light emission point to be turned on of the light source is known, the target object is irradiated with mask images according to a plurality of mask patterns depending on the positions of the light emission point of the light source and the spatial modulation element, and a computer calculates a correlation between a light intensity detected by a detector and the mask image with which the target object is irradiated, to construct an image of the target object. With this, an imaging device and an imaging method capable of achieving an increase in speed of mask pattern irradiation in single-pixel imaging and significantly increasing an input speed of single-pixel imaging are provided.