The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 29, 2025

Filed:

Sep. 20, 2021
Applicant:

Infineon Technologies Dresden Gmbh & Co. KG, Dresden, DE;

Inventors:

Rolf Weis, Dresden, DE;

Ahmed Mahmoud, Freising, DE;

Marco Mueller, Pirna, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/78 (2005.12); H01L 29/06 (2005.12); H01L 29/08 (2005.12); H01L 29/10 (2005.12); H01L 29/66 (2005.12);
U.S. Cl.
CPC ...
H01L 29/7823 (2012.12); H01L 29/0696 (2012.12); H01L 29/0878 (2012.12); H01L 29/1095 (2012.12); H01L 29/66681 (2012.12);
Abstract

According to an embodiment of a semiconductor device, the device includes: a transistor or diode device formed in a semiconductor substrate; an insulating material at least partially covering a lateral drift zone of the transistor or diode device or a termination region; and a fill pattern disposed over the lateral drift zone or termination region, the fill pattern having a variable density that follows equipotential lines of an electric field distribution expected between the fill pattern at a surface of the lateral drift zone or termination region during operation of the semiconductor device. Corresponding methods of producing the semiconductor device are also described.


Find Patent Forward Citations

Weis, Rolf. (2025). Fill pattern for power transistor and diode devices (U.S. Patent No. 12288819). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12288819

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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