The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 29, 2025

Filed:

Dec. 05, 2023
Applicant:

Innolux Corporation, Miao-Li County, TW;

Inventors:

Chien-Hsing Lee, Miao-Li County, TW;

Chin-Lung Ting, Miao-Li County, TW;

Jung-Chuan Wang, Miao-Li County, TW;

Hong-Sheng Hsieh, Miao-Li County, TW;

Assignee:

INNOLUX CORPORATION, Miao-Li County, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/36 (2005.12); G03F 1/60 (2011.12); G03F 7/09 (2005.12); G03F 7/20 (2005.12);
U.S. Cl.
CPC ...
G03F 7/2002 (2012.12); G03F 1/60 (2012.12); G03F 7/093 (2012.12); G03F 7/36 (2012.12);
Abstract

An electronic device is provided. The electronic device includes a base and a conductive layer that is disposed on the base and patterned by a plurality of processes. The plurality of processes include providing a mask substrate. The mask substrate includes a first substrate and a patterned substrate. In the cross-sectional view, the width of the first substrate is greater than or equal to the width of the patterned substrate. The plurality of processes include arranging the mask substrate and the base correspondingly. The plurality of processes also include performing exposure and development processes on the conductive layer for patterning the conductive layer, and removing the mask substrate.


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