The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 2025
Filed:
Aug. 01, 2022
Beijing Boe Optoelectronics Technology Co., Ltd., Beijing, CN;
Boe Technology Group Co., Ltd., Beijing, CN;
Ruomei Bian, Beijing, CN;
Jian Wang, Beijing, CN;
Yong Zhang, Beijing, CN;
Xianglei Qin, Beijing, CN;
Xing Xu, Beijing, CN;
Jiaxing Wang, Beijing, CN;
Xuan Zhong, Beijing, CN;
Honggui Jin, Beijing, CN;
Liangzhen Tang, Beijing, CN;
Zhaohu Yu, Beijing, CN;
Wulin Zhang, Beijing, CN;
Yongzhong Zhang, Beijing, CN;
Beijing BOE Optoelectronics Technology Co., Ltd., Beijing, CN;
BOE TECHNOLOGY GROUP CO., LTD., Beijing, CN;
Abstract
An array substrate, including a first substrate, and a plurality of gate lines and a plurality of data lines defining a plurality of subpixel regions each including a reflective region and a transmissive region, wherein the reflective region includes a reflective electrode, and the transmissive region includes a transmissive electrode; a first spacing region including a preset subregion is between two adjacent reflective electrodes in a first direction; the data line includes a first portion in the preset subregion, and a width of the first portion in the first direction is smaller than that of the preset subregion; and the array substrate further includes a first light shielding pattern opposite to the first portion and in the same layer as the gate lines, where an orthographic projection of the first light shielding pattern on the first substrate completely covers an orthographic projection of the preset subregion on the first substrate.