The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 2025
Filed:
Apr. 18, 2023
Applicant:
Raytheon Technologies Corporation, Farmington, CT (US);
Inventors:
Tyler G. Vincent, Portland, CT (US);
Joshua William Owen Richards, Manchester, CT (US);
Assignee:
RTX Corporation, Farmington, CT (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F01D 5/08 (2005.12); F01D 5/14 (2005.12); F01D 5/18 (2005.12); F01D 25/12 (2005.12); F28F 13/12 (2005.12); F15D 1/00 (2005.12);
U.S. Cl.
CPC ...
F01D 5/18 (2012.12); F01D 5/08 (2012.12); F01D 5/085 (2012.12); F01D 5/145 (2012.12); F01D 5/187 (2012.12); F01D 25/12 (2012.12); F28F 13/12 (2012.12); F05D 2220/32 (2012.12); F05D 2240/12 (2012.12); F05D 2240/127 (2012.12); F05D 2240/30 (2012.12); F05D 2260/20 (2012.12); F15D 1/003 (2012.12);
Abstract
A layout for asymmetric trip strips including a flow passage having a lower wall and an upper wall opposite the lower wall, each of the lower wall and the upper wall including an inner surface, the flow passage having a passage inlet and a length L and a diameter d; multiple skewed trip strips extending from at least one inner surface of the lower wall or the upper wall; and at least one periodic reflection of the skewed trip strips along the flow passage downstream of the passage inlet at a frequency with a length-to-diameter ratio of L/d≤20.