The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 2025
Filed:
Oct. 18, 2021
Applicant:
Merck Patent Gmbh, Darmstadt, DE;
Inventors:
EunJeong Jeong, Gyeonggi-do, KR;
Durairaj Baskaran, Bridgewater, NJ (US);
Jihoon Kim, North Wales, PA (US);
Assignee:
Merck Patent GmbH, Darmstadt, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F 8/40 (2005.12); C07F 9/40 (2005.12); C08F 4/649 (2005.12); C08F 112/08 (2005.12); C08F 120/14 (2005.12); C09D 125/06 (2005.12); C07F 9/32 (2005.12); C08F 4/629 (2005.12); C08F 30/02 (2005.12); C08F 130/02 (2005.12); C08F 230/02 (2005.12); C08L 43/02 (2005.12); C09D 133/12 (2005.12); C09D 143/02 (2005.12); C09J 143/02 (2005.12); C09J 185/02 (2005.12);
U.S. Cl.
CPC ...
C08F 4/6497 (2012.12); C07F 9/4021 (2012.12); C08F 112/08 (2012.12); C08F 120/14 (2012.12); C09D 125/06 (2012.12); C07F 9/3229 (2012.12); C08F 4/6297 (2012.12); C08F 8/40 (2012.12); C08F 30/02 (2012.12); C08F 130/02 (2012.12); C08F 230/02 (2012.12); C08F 2810/40 (2012.12); C08J 2343/02 (2012.12); C08J 2443/02 (2012.12); C08L 43/02 (2012.12); C09D 133/12 (2012.12); C09D 143/02 (2012.12); C09J 143/02 (2012.12); C09J 185/02 (2012.12);
Abstract
The disclosed subject matter relates compounds of structure (I), and polymers of structure (II) having a polydispersity ranging from 1 to about 1.1, compositions comprising said polymers and a spin casting solvent, the process of forming a pinning layer selectively on metal with said composition and the process of using said pinning layers to affect chemoepitaxy directed self-assembly of an overlying block copolymer, and the subsequent process of pattern transfer of this self-assembled layer into a substrate by etching.