The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 2025
Filed:
Oct. 05, 2022
Dalian University of Technology, Liaoning, CN;
Shufen Zhang, Liaoning, CN;
Changtong Zhou, Liaoning, CN;
Wenbin Niu, Liaoning, CN;
Wei Ma, Liaoning, CN;
Bingtao Tang, Liaoning, CN;
Suli Wu, Liaoning, CN;
DALIAN UNIVERSITY OF TECHNOLOGY, Liaoning, CN;
Abstract
A double-inverse opal photonic crystal resin film is formed by embedding nanospheres in pores of polyacrylate inverse opal framework material and then filling the pores of the double-inverse opal photonic crystal resin film with an ethanol solution with hydrophilic acrylamide dissolved therein followed by photopolymerization to form a polyacrylamide network, so as to obtain the double-inverse opal photonic crystal resin film using water as ink. A mass fraction of hydrophilic acrylamide in the ethanol solution is 2 to 8 wt. %. The resin film can induce water to penetrate into the pores of the double-inverse opal photonic crystal resin film, making the nanospheres in the pores of the inverse opal framework distribute from random to order under the action of buoyancy force, thereby eliminating scattering interference and producing brilliant structural colors by regulating refractive index contrast.