The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 21, 2025

Filed:

Jan. 19, 2020
Applicant:

Lg Electronics Inc., Seoul, KR;

Inventors:

Hyunwoo Park, Seoul, KR;

Wooil Kim, Seoul, KR;

Gyegwang Lee, Seoul, KR;

Imjun Cho, Seoul, KR;

Assignee:

LG ELECTRONICS INC., Seoul, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05H 1/34 (2005.12); H05H 1/28 (2005.12); H05H 1/42 (2005.12);
U.S. Cl.
CPC ...
H05H 1/3405 (2012.12); H05H 1/28 (2012.12); H05H 1/34 (2012.12); H05H 1/3478 (2021.04); H05H 1/42 (2012.12);
Abstract

The present disclosure relates to a thermal plasma processing apparatus capable of efficiently using thermal plasma and securing a reaction time for the thermal decomposition of the processing gas. A Thermal plasma processing apparatus according to an embodiment of the present disclosure includes a torch part in which an arc is generated between a negative electrode and a positive electrode, and in which a processing gas to be thermally decomposed by the arc is injected between the negative electrode and the positive electrode, a power supply part configured to be connected to the negative electrode and the positive electrode and to apply a high voltage between the negative electrode and the positive electrode, and a reaction part configured to communicate with the torch part and to generate turbulence in the processing gas passing through the torch part.


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