The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2025
Filed:
Jul. 28, 2020
New Power Plasma Co., Ltd., Suwon-si, KR;
Dai Kyu Choi, Seoul, KR;
Eun Seok Lim, Suwon-si, KR;
NEW POWER PLASMA CO., LTD., Suwon-si, KR;
Abstract
Provided is a plasma reaction device which can reduce a heating value through installation of a dual-coil type inductor in a resonant network circuit part, and a cooling method thereof. The plasma reaction device may include: a reactor part for exciting an input gas to be in a plasma state by using transformer coupled plasma; a resonant network circuit part electrically connected to the reactor part and including at least one inductor and at least one condenser; and a power supply part for applying power to the resonant network circuit part, wherein the inductor may comprise: a first coil which is formed between a first terminal and a second terminal and at least a portion of which is spirally wound to form a first cylindrical reception space inward; and a second coil which is formed between the first terminal and the second terminal to be connected to the first coil in series, and spirally wound in the first cylindrical reception space.