The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 21, 2025

Filed:

Mar. 06, 2024
Applicant:

Sap SE, Walldorf, DE;

Inventors:

Jan Rittinger, Wiesloch, DE;

Johannes Meinecke, Heidelberg, DE;

Gregor Hackenbroich, Hockenheim, DE;

Richard Pilz, Dresden, DE;

Katja Pfeifer, Dresden, DE;

Tom Spiegler, Langebrück, DE;

Franz Josef Grueneberger, Dresden, DE;

Assignee:

SAP SE, Walldorf, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 16/23 (2018.12);
U.S. Cl.
CPC ...
G06F 16/2343 (2018.12);
Abstract

The present disclosure involves systems, software, and computer implemented methods for automatically extending a partially-editable dataset copy. One example method includes identifying, for a data set, extension filter criteria that extends a current filter that defines an editable portion of the data set. An extended filter is automatically generated for the data set based on the extension filter criteria and the current filter. Additional data is copied into the partially-editable copy of the data set based on the extended filter and the current filter to generate an updated partially-editable copy of the data set. The current filter is replaced with the extended filter to create a new current filter. An updated exposed view is generated using the new current filter that exposes the updated partially-editable copy of the data set and an updated non-editable portion of the data set.


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