The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 21, 2025

Filed:

Sep. 14, 2020
Applicant:

Aveva Software, Llc, Lake Forest, CA (US);

Inventors:

Aldimir Lyubchev Mihnev, Lake Forest, CA (US);

Prarthana Rohitkumar Shah, Lake Forest, CA (US);

Brian Kenneth Erickson, Lake Forest, CA (US);

William Charles Winn Bielke, Lake Forest, CA (US);

Assignee:

Aveva Software, LLC, Lake Forest, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G05B 19/4063 (2005.12); G06N 3/08 (2022.12);
U.S. Cl.
CPC ...
G05B 19/4063 (2012.12); G06N 3/08 (2012.12); G05B 2219/31449 (2012.12);
Abstract

A novel system includes an intelligent process anomaly detection and trend projection system which is configured to train artificial intelligence and machine learning systems for anomaly prediction in industrial systems according to some embodiments. In some embodiments, such intelligent process anomaly detection and trend projection system is configured to determine an estimated remaining useful life of an industrial asset. For example, in some embodiments, the system is configured to identify a degradation part of the signal and a normal part of the signal; separate the degradation part of the signal from the normal part of the signal; identify one or more patterns of a degradation part of the signal and the normal part of the signal; and determine an anomaly prediction based on the one or more patterns.


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