The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2025
Filed:
Jul. 08, 2020
Liquid chemical, method for producing liquid chemical, and method for analyzing test target solution
Applicant:
Fujifilm Corporation, Tokyo, JP;
Inventor:
Tetsuya Kamimura, Haibara-gun, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/32 (2005.12); G01N 15/06 (2005.12); G01N 21/95 (2005.12); G03F 7/004 (2005.12); G03F 7/11 (2005.12); G01N 15/075 (2023.12); G03F 7/20 (2005.12);
U.S. Cl.
CPC ...
G03F 7/325 (2012.12); G01N 15/06 (2012.12); G01N 21/9505 (2012.12); G03F 7/0048 (2012.12); G03F 7/11 (2012.12); G01N 15/075 (2023.12); G03F 7/2006 (2012.12);
Abstract
An object is to provide a liquid chemical exhibiting excellent defect inhibitive performance even in a case of being applied to a resist process by KrF excimer laser exposure and ArF excimer laser exposure. Another object is to provide a method for analyzing a test target solution and a method for producing a liquid chemical. A liquid chemical includes an organic solvent; and metal-containing particles containing a metal atom and having a particle size of 10 to 100 nm, in which the number of the metal-containing particles contained is 1.0×10to 1.0×10particles/cm.