The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2025
Filed:
Sep. 01, 2021
Applicant:
Kunshan Go-visionox Opto-electronics Co., Ltd., Jiangsu, CN;
Inventors:
Assignee:
KunShan Go-Visionox Opto-Electronics Co., Ltd., Kunshan, CN;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/04 (2005.12); C23C 14/24 (2005.12);
U.S. Cl.
CPC ...
C23C 14/042 (2012.12); C23C 14/24 (2012.12);
Abstract
A mask includes an opening area and a shelter area adjacent to the opening area, the opening area includes an opening pattern, the shelter area includes a buffer pattern adapted to the opening pattern. This application achieves a purpose that a sudden change of stress at a boundary between the opening area and the shelter area is buffered, thereby ensuring that the pull of the mesh as it opens may be smoothly transmitted from the shelter area to the opening area. In addition, this application may also effectively improve meshing accuracy of the mask, thereby improving a yield of vapor deposition products.