The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2025
Filed:
Jul. 21, 2022
T.en Process Technology, Inc., Houston, TX (US);
Douglas S. Hubbell, Sudbury, MA (US);
Slawomir A. Oleksy, Billerica, MA (US);
T.EN Process Technology, Inc., Houston, TX (US);
Abstract
A method for enhancing the recovery of styrene includes feeding a hot liquid residue stream to a stripping vessel from a styrene monomer purification finishing system. The hot liquid residue stream includes styrene and compounds less volatile than styrene. The method includes introducing a gas to the stripping vessel to strip a portion of the styrene as vapor, generating a vaporized styrene portion, returning the vaporized styrene portion and the gas to the styrene monomer purification finishing system, recovering at least a portion of the vaporized styrene portion into a styrene monomer product, and producing a final liquid residue stream from a bottom of the stripping vessel with a lower concentration of styrene than the hot liquid residue stream feeding the stripping vessel.