The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 21, 2025

Filed:

Oct. 08, 2019
Applicant:

Cornell University, Ithaca, NY (US);

Inventors:

Yong Lak Joo, Ithaca, NY (US);

Mohammed Alamer, Ithaca, NY (US);

Brian Williams, Ithaca, NY (US);

Assignee:

Cornell University, Ithaca, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01B 32/19 (2016.12); B01J 19/02 (2005.12); B01J 19/28 (2005.12);
U.S. Cl.
CPC ...
C01B 32/19 (2017.07); B01J 19/02 (2012.12); B01J 19/28 (2012.12); B01J 2219/00033 (2012.12); B01J 2219/0254 (2012.12); B01J 2219/0286 (2012.12); B01J 2219/0295 (2012.12); B01J 2219/1943 (2012.12); C01B 2204/04 (2012.12); C01B 2204/30 (2012.12); C01B 2204/32 (2012.12); C01P 2002/72 (2012.12); C01P 2002/78 (2012.12); C01P 2002/82 (2012.12); C01P 2004/03 (2012.12);
Abstract

Provided herein are high throughput continuous or semi-continuous reactors and processes for manufacturing graphenic materials, such as graphene. Such processes are suitable for manufacturing graphenic materials at rates that are up to hundreds of times faster than conventional techniques, and have little batch-to-batch variation. Also provided herein are graphenic compositions of matter, including large, high quality and/or highly uniform graphene.


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