The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 14, 2025

Filed:

Jun. 30, 2021
Applicant:

Semes Co., Ltd., Cheonan-si, KR;

Inventors:

Jinwoo Jung, Seoul, KR;

Yong Hee Lee, Cheonan-si, KR;

Assignee:

SEMES CO., LTD., Cheonan-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2005.12); H01L 21/673 (2005.12); H01L 21/677 (2005.12);
U.S. Cl.
CPC ...
H01L 21/67742 (2012.12); H01L 21/67023 (2012.12); H01L 21/67034 (2012.12); H01L 21/67326 (2012.12); H01L 21/67745 (2012.12);
Abstract

An apparatus for treating a substrate is provided. The apparatus for treating the substrate includes a first process chamber to perform a liquid treatment process with respect to the substrate, a second process chamber to perform a drying treatment process with respect to the substrate which is liquid treated in the first process chamber, a first hand to introduce the substrate to the first process chamber, before the liquid treatment process is performed, a second hand to withdraw the substrate from the first process chamber after the liquid treatment process is performed and to introduce the substrate into the second process chamber, and a third hand to withdraw the substrate from the second process chamber after the drying treatment process is performed.


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