The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 14, 2025

Filed:

Mar. 15, 2022
Applicant:

Kabushiki Kaisha Toshiba, Tokyo, JP;

Inventors:

Takayuki Tajima, Sagamihara, JP;

Kazuhito Higuchi, Yokohama, JP;

Susumu Obata, Yokohama, JP;

Mitsuo Sano, Kamakura, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/306 (2005.12); H01L 21/67 (2005.12);
U.S. Cl.
CPC ...
H01L 21/30608 (2012.12); H01L 21/67075 (2012.12);
Abstract

According to one embodiment, an etching apparatus includes a first container including an opening covered by a semiconductor substrate; a second container including an opening covered by a catalyst layer; a first flow path configured to communicate with the first container; a second flow path configured to communicate with the second container; a cation exchange film interposed between the first flow path and the second flow path and allowing at least protons to pass through; and an electric field applier configured to apply an electric field to the semiconductor substrate.


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