The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2025
Filed:
Jul. 22, 2021
Applicant:
Korea Institute of Science and Technology, Seoul, KR;
Inventors:
Seung Sang Hwang, Seoul, KR;
Soon Man Hong, Seoul, KR;
Kyung Youl Baek, Seoul, KR;
Chong Min Koo, Seoul, KR;
Albert Lee, Seoul, KR;
Seon Joon Kim, Seoul, KR;
You Mee Choi, Seoul, KR;
Assignee:
Korea Institute of Science and Technology, Seoul, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/075 (2005.12); C08G 77/04 (2005.12); C08G 77/18 (2005.12); C08G 77/20 (2005.12); C08G 77/28 (2005.12); H01B 3/30 (2005.12);
U.S. Cl.
CPC ...
G03F 7/0758 (2012.12); C08G 77/045 (2012.12); C08G 77/18 (2012.12); C08G 77/28 (2012.12); H01B 3/307 (2012.12);
Abstract
The present disclosure relates to a UV- and heat-curable ladder-like polysilsesquioxane copolymer and a method for preparing the same. Since a controlled functionality can be provided only on a desired region via a thiol-ene click reaction without an additional additive, an insulating layer having a low dielectric constant and a microcircuit pattern can be formed without an additional etching process.