The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2025
Filed:
Nov. 27, 2022
Canon Kabushiki Kaisha, Tokyo, JP;
Hiroshi Sato, Tochigi, JP;
Tetsuji Okada, Saitama, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
An imprint method of performing an imprint process for a shot region of a substrate using a mold is provided. The substrate includes a valid region where a chip is to be formed, and an invalid region outside the valid region where no chip is to be formed, and the invalid region is a region formed by etching an outer region outside the valid region. The method includes deciding, based on a height difference between the valid region and the invalid region, an imprint condition for a partial shot region defined by an outer edge of the valid region, and performing the imprint process for the partial shot region in accordance with the decided imprint condition.