The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 14, 2025

Filed:

Sep. 29, 2022
Applicants:

Chongqing Institute of East China Normal University, Chongqing, CN;

East China Normal University, Shanghai, CN;

Yunnan Huapu Quantum Material Co., Ltd, Yunnan, CN;

Roi Optoelectronics Technology Co, Ltd., Shanghai, CN;

Chongqing Huapu Scientific Instrument Co., Ltd., Chongqing, CN;

Chongqing Huapu Intelligent Equipment Co., Ltd., Chongqing, CN;

Guangdong Roi Optoelectronics Technology Co., Ltd., Guangdong, CN;

Inventors:

Heping Zeng, Chongqing, CN;

Mengyun Hu, Chongqing, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/71 (2005.12); G01J 3/18 (2005.12); G02B 27/10 (2005.12);
U.S. Cl.
CPC ...
G01N 21/718 (2012.12); G01J 3/1809 (2012.12); G02B 27/1006 (2012.12);
Abstract

A multipulse-induced spectroscopy method based on a femtosecond plasma grating includes: pre-exciting a sample on a stage by providing a femtosecond pulse to form the femtosecond plasma grating; providing a post-pulse on the sample at an angle to excite the sample to generate a plasma, wherein the post-pulse comprises one or more femtosecond pulses, there is a time interval between the femtosecond pulse and the post-pulse, and the time interval is less than a lifetime of the femtosecond plasma grating; and receiving and analyzing a fluorescence emitted from the plasma to determine element information of the sample.


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