The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2025
Filed:
Feb. 15, 2023
Applicant:
Fujifilm Corporation, Tokyo, JP;
Inventors:
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C11D 3/34 (2005.12); C11D 1/04 (2005.12); C11D 1/14 (2005.12); C11D 1/34 (2005.12); C11D 3/00 (2005.12); C11D 3/30 (2005.12); H01L 21/02 (2005.12); H01L 21/3213 (2005.12);
U.S. Cl.
CPC ...
C11D 3/3454 (2012.12); C11D 1/04 (2012.12); C11D 1/143 (2012.12); C11D 1/34 (2012.12); C11D 3/0026 (2012.12); C11D 3/0073 (2012.12); C11D 3/30 (2012.12); H01L 21/02065 (2012.12); H01L 21/02074 (2012.12); H01L 21/02178 (2012.12); H01L 21/02186 (2012.12); H01L 21/02244 (2012.12); C11D 2111/22 (2023.12); H01L 21/32138 (2012.12);
Abstract
A treatment liquid for a semiconductor device contains water, a removing agent, and a copolymer. The copolymer has a first repeating unit having at least one group selected from a primary amino group, a secondary amino group, a tertiary amino group, and a quaternary ammonium cation, and a second repeating unit different from the first repeating unit. A substrate treatment method using the treatment liquid is also provided.