The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2025
Filed:
Jul. 08, 2019
Forge Nano, Inc., Thornton, CO (US);
John Barnes, Broomfield, CO (US);
Karen Buechler, Broomfield, CO (US);
Christopher Gump, Broomfield, CO (US);
Daniel Higgs, Broomfield, CO (US);
Paul Nelson, Broomfield, CO (US);
Wayne Simmons, Broomfield, CO (US);
Forge Nano, Inc., Thornton, CO (US);
Abstract
Atomic Layer Deposition (ALD) and Molecular Layer Deposition (MLD) provide precise and conformal coatings that are employed to modify the properties of powders for additive manufacturing (AM). We have surprisingly discovered that use of a limited number of ALD cycles can impart improved flowability. In various aspects, the coating may provide one or more advantages such as novel material properties, increased flowability, improved sintering, enhanced stability during storage, and prevention of premature sintering.