The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2025
Filed:
Dec. 20, 2022
Semes Co., Ltd., Cheonan-si, KR;
Yong Hyun Choi, Cheonan-si, KR;
Young Hun Lee, Cheonan-si, KR;
Seung Hoon Oh, Cheonan-si, KR;
Mi So Park, Daejeon, KR;
Tae Jong Choi, Anyang-si, KR;
Yong Sun Ko, Suwon-si, KR;
Jin Woo Jung, Cheonan-si, KR;
SEMES CO., LTD., Chungcheongnam-do, KR;
Abstract
The present invention provides a method for treating a substrate. The method for treating a substrate comprises: treating the substrate with liquid; and drying the liquid-treated substrate, and the liquid treatment step includes: a first liquid supply step of supplying a first liquid to an upper surface of the rotating substrate; and a second liquid supply step of supplying a second liquid to an upper surface of the rotating substrate, and in the second liquid supply step, a rotation speed of the substrate is adjusted such that the second liquid supplied on the substrate flows from a central region of the substrate to an edge region of the substrate.