The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 08, 2025

Filed:

Feb. 26, 2021
Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventors:

Asuka Wakita, Kyoto, JP;

Naoki Sawazaki, Kyoto, JP;

Takashi Ota, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06N 5/04 (2023.01); G06N 20/00 (2019.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
G06N 5/04 (2013.01); G06N 20/00 (2019.01); H01L 21/67253 (2013.01);
Abstract

A learned model generating method includes: acquiring learning data; and generating a learned model for estimating a factor of an abnormality of a processing target substrate after processing using a processing fluid by performing machine learning of the learning data. The learning data includes a feature quantity and abnormality factor information. The abnormality factor information represents a factor of an abnormality of a learning target substrate after processing using the processing fluid. The feature quantity includes first feature quantity information representing a feature of a time transition of section data in time series data representing a physical quantity of an object used by a substrate processing device that processes the learning target substrate using the processing fluid. The first feature quantity information is represented using times.


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