The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 08, 2025

Filed:

Jun. 29, 2022
Applicant:

Nanjing University of Posts and Telecommunications, Nanjing, CN;

Inventors:

Yongjin Wang, Nanjing, CN;

Jiabin Yan, Nanjing, CN;

Jinlong Piao, Nanjing, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 6/13 (2006.01); G02B 6/12 (2006.01); H10D 1/47 (2025.01); H10D 30/01 (2025.01); H10D 30/47 (2025.01); H10D 62/85 (2025.01); H10F 55/255 (2025.01); H10F 71/00 (2025.01); H10F 77/12 (2025.01); H10F 77/124 (2025.01); H10F 77/14 (2025.01); H10H 20/01 (2025.01); H10H 20/812 (2025.01); H10H 20/825 (2025.01);
U.S. Cl.
CPC ...
G02B 6/12004 (2013.01); G02B 6/13 (2013.01); H10D 1/47 (2025.01); H10D 30/015 (2025.01); H10D 30/475 (2025.01); H10D 62/8503 (2025.01); H10F 55/255 (2025.01); H10F 71/1278 (2025.01); H10F 77/1246 (2025.01); H10F 77/146 (2025.01); H10H 20/01335 (2025.01); H10H 20/812 (2025.01); H10H 20/825 (2025.01); G02B 2006/12123 (2013.01);
Abstract

A monolithic optoelectronic integrated circuit is provided, including: a substrate including photonic integrated device region and a peripheral circuit region; a first GaN-based multi-quantum well optoelectronic PN-junction device including a first P-type ohmic contact electrode and a first N-type ohmic contact electrode; and a first GaN-based field-effect transistor, where the first GaN-based field-effect transistor includes a first gate dielectric layer disposed on the surface of the substrate and having a first recess, a first gate filled within the first recess, and a first source and a first drain that are disposed the opposite sides of the first gate, where the first source is electrically connected to the first P-type ohmic contact electrode, the first drain is configured to be electrically connected to a first potential.


Find Patent Forward Citations

Wang, Yongjin. (2025). Monolithic optoelectronic integrated circuit and method for forming same (U.S. Patent No. 12271028). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12271028

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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