The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 08, 2025

Filed:

Oct. 11, 2022
Applicant:

Wenzhou Medical University, Wenzhou, CN;

Inventors:

Min Xu, Wenzhou, CN;

Zhineng Xie, Wenzhou, CN;

Weihao Lin, Wenzhou, CN;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01M 11/02 (2006.01);
U.S. Cl.
CPC ...
G01M 11/0207 (2013.01);
Abstract

A reciprocal polar decomposition for a backscattering Mueller matrices, including the following steps: step 1, according to the reciprocity of forward light path and backward light path, transforming the Mueller matrix M of backscattering into a symmetric matrix QM; step 2, obtaining a diattenuator matrix Mby a matrix QMG; step 3, obtaining eigenvalues and eigenvectors through orthogonal decomposition; step 4, sorting the eigenvectors to obtain a depolarization matrix Mand a retarder matrix M; and step 5, obtaining polarization parameters by the obtained depolarization matrix Mand retarder matrix M. By using this decomposition, a systematic solution for decomposing the backscattering Mueller matrix is given firstly, and polarization parameters (such as an orientation angle, linear retarder, and depolarization) for characterizing a microstructure of a medium are obtained.


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