The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2025
Filed:
Jan. 18, 2019
Applicant:
Yokogawa Electric Corporation, Tokyo, JP;
Inventor:
Takeyuki Mogi, Musashino, JP;
Assignee:
Yokogawa Electric Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C12M 1/00 (2006.01); C12M 1/26 (2006.01); C12M 1/36 (2006.01); C12N 5/073 (2010.01); C12N 5/071 (2010.01);
U.S. Cl.
CPC ...
C12M 29/06 (2013.01); C12M 33/14 (2013.01); C12M 41/48 (2013.01); C12N 5/0605 (2013.01); C12N 5/069 (2013.01); C12N 2501/165 (2013.01);
Abstract
A culture additive diffusion mechanism () includes an additive retention unit () configured to retain an additive () used in a culture and a diffusion adjustment unit () configured to adjust a diffusion rate of the additive () from the inside of the additive retention unit () to the outside of the additive retention unit ().