The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2025
Filed:
Sep. 09, 2021
Applicant:
Naieel Technology Inc., Daejeon, KR;
Inventors:
Jae Woo Kim, Daejeon, KR;
Eun Kwang Park, Daejeon, KR;
Jae Hoon Kim, Changwon-si, KR;
Ji Seung Kim, Daejeon, KR;
Tae Hyun Jung, Daejeon, KR;
Assignee:
NAIEEL TECHNOLOGY INC., Daejeon, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C01B 21/064 (2006.01); B01J 4/00 (2006.01); B01J 19/18 (2006.01); B82Y 30/00 (2011.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
C01B 21/0641 (2013.01); B01J 4/007 (2013.01); B01J 19/18 (2013.01); B01J 2204/002 (2013.01); B82Y 30/00 (2013.01); B82Y 40/00 (2013.01); C01P 2002/10 (2013.01);
Abstract
A standalone precursor is for synthesizing nanomaterials such as boron nitride nanotubes. The standalone precursor includes a pillar. Pores and through-holes are defined in the pillar. Each of the through-holes extends continuously from a first opening on an outer surface of the standalone precursor to a second opening on the outer surface of the standalone precursor. The first opening is diametrically opposite to the second opening across the standalone precursor.