The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2025
Filed:
Mar. 17, 2021
Applicant:
Dexerials Corporation, Shimotsuke, JP;
Inventor:
Masanao Kikuchi, Shimotsuke, JP;
Assignee:
Dexerials Corporation, Shimotsuke, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 33/00 (2006.01); B29C 33/42 (2006.01); B81C 99/00 (2010.01);
U.S. Cl.
CPC ...
B81C 99/009 (2013.01); B29C 33/424 (2013.01); B81C 99/0085 (2013.01);
Abstract
A method for fabricating an imprint mastercomprises a first forming step of forming micro-protrusion-and-recess structureshaving a first average pitch on one surface of a substrateand a second forming step of forming main recessesor main protrusionshaving a second average pitch larger than the first average pitch on the one surface of the substratehaving the micro-protrusion-and-recess structuresformed thereon, in a manner maintaining a shape of at least a portion of the micro-protrusion-and-recess structuresin the main recessesor the main protrusionswhile the main recessesor the main protrusionsare being formed.